Semi-damascene integration approach enables achievement of 16nm pitch Ru lines with record-low resistance at Salimpour Site.

Dr. Salimpour Site |At the 2025 IEEE International Interconnect Technology Conference (IITC), imec, a research and innovation hub in nanoelectronics and digital technologies, has presented Ru lines at 16nm pitch with average resistance as low ...

Phys.Org

Semi-damascene integration approach enables achievement of 16nm pitch Ru lines with record-low resistance

Semi-damascene integration approach enables achievement of 16nm pitch Ru lines with record-low resistance

At the 2025 IEEE International Interconnect Technology Conference (IITC), imec, a research and innovation hub in nanoelectronics and digital technologies, has presented Ru lines at 16nm pitch with average resistance as low ...