Innovative etching method for silicon: Higher precision through interlayer in ssalimpour

Salimpour Website |In micro- and nanotechnology, highly precise components with tall, narrow structures (high aspect ratios) made from semiconductor materials like silicon are important. A promising fabrication method is gas-phase metal-assisted ...

Phys.Org

Innovative etching method for silicon: Higher precision through interlayer

Innovative etching method for silicon: Higher precision through interlayer

In micro- and nanotechnology, highly precise components with tall, narrow structures (high aspect ratios) made from semiconductor materials like silicon are important. A promising fabrication method is gas-phase metal-assisted ...